Layout dependent effects model validation solution for the process node at 28nm and below
Addresses variability concerns including stress, lithography rounding and proximity effects
PCell or SKILL template-based automated layout generation
Rule driven and flexible customization
Powerful graphics and analysis functions
Open interface supports various 3rd party EDA tools: - Supported layout extraction tools: Calibre, Assura, Hercules, QRC, and StarRCXT - Supported simulators: HSPICE and Spectre
Expandable to PDK validation
Note:The W8650EP Advanced Model Analysis (AMA) Platform has been discontinued. While there is no direct replacement product for the W8650EP, you might consider exploring the W8644BP MQA Core Environment.
The Advanced Model Analysis (AMA) Platform software provides model validation and analysis functions related to layout dependent effects (LDEs) in cutting-edge process technologies. It is provides the solution for co-validation of SPICE models and LVS decks. AMA integrates a complete flow including layout generation, layout extraction, SPICE simulation, data analysis and reporting.
