Webinars
PIC fabrication tolerances are inevitable and strongly degrade device yield, unless their impact on overall performance characteristics is considered during the design process. We present a general-purpose schematic-driven design framework that provides easy access to statistical performance techniques. By introducing a novel method that allows for the identification of critical light paths and applying automated phase compensation inside the models, the analysis of fabrication tolerances on-wafer and between wafers is significantly simplified. We demonstrate its application in several PIC designs including complex photonics-based neural networks.
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