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AMA 2011.1.3 Product Release

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Prices for: Canada (English)

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Key Features & Specifications

  • Layout dependent effects model validation solution for the process node at 28nm and below
  • Addresses variability concerns including stress, lithography rounding and proximity effects
  • PCell or SKILL template-based automated layout generation
  • Rule driven and flexible customization
  • Powerful graphics and analysis functions
  • Open interface that supports various 3rd party EDA tools:
    - Supported layout extraction tools: Calibre, Assura, Hercules, QRC, and StarRCXT
    - Supported simulators: HSPICE and Spectre
  • Expandable for process design kit (PDK) validation
     

Description

Advanced Model Analysis (AMA)The Advanced Model Analysis (AMA) 2011.1.3 software release includes a number of new features and improvements. AMA 2011.1.3 provides model validation and analysis functions related to layout dependent effects (LDEs) in cutting-edge process technologies. It provides the solution for co-validation of SPICE models and LVS decks. AMA integrates a complete flow including layout generation, layout extraction, SPICE simulation, data analysis and reporting.

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