Achieving First Pass Success and High Yield
A successful design does more than just meet specifications. When manufactured, especially in big quantities, variation in components and in manufacturing process parameters around nominal values can result in failure to meet specifications in many, if not most, final products. Design iterations and extra wafer runs therefore become necessary, but they take time and can cost hundreds of thousands of dollars. Consequently, today’s advanced technology MMIC designs – especially those being used for high volume products - require the use of DFM techniques. Designs employing these techniques are less sensitive to process variation and result in first-pass success, as well as much higher yield; saving both time and money.
Learn more about, "An Innovative And Integrated Approach to III-V Circuit Design" in the September 2008 issue of Microwave Journal
ADS features two unique solutions - Design of Experiments (DOE) and Yield Sensitivity Histograms (YSH) - both of which are designed to turn any standard design into a robust one by providing MMIC designers full insight into the circuit and interaction between its elements. The tools pinpoint any sensitive parts and sensitive matching networks in the design that may cause problems in yield. Designers then are able to fix the problems prior to production, resulting in robust, higher yield designs.
With today’s advanced technology, DFM techniques can no longer be bypassed. Instead, they must be utilized to the fullest, especially in high-volume products. An effective DFM process is not possible without the ADS DOE tool. Also required is the ADS Data-Display Post Processing capability which is used to extract and create YSHs, along with many other meaningful data.
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